Self aligned vertical mirrors and V-grooves applied to a self-latching matrix switch for optical networks

This paper reports a new and low cost method of fabrication for M*N matrix switch using wet etching of silicon: a self-aligned batch process allowing the fabrication of vertical mirrors and V-grooves is performed in one-level of mask in [100] silicon wafer. The feasibility of a self-latching system with electromagnetic force is shown for the actuation of switch. Promising performances such as insertion loss lower than 0.5 dB, submillisecond switching time (0.4 ms) and reliable operation (20 > million cycles) are achieved.