Influence of silicon dioxide-silicon interface trap charges on the performance of monolithic metal-zinc oxide-silicon nitride-silicon dioxide-silicon convolver

An enhancement in the convolution efficiency is obtained by annihilating the SiO/sub 2/-Si interface trap charges in the metal-ZnO-Si/sub 3/N/sub 4/-SiO/sub 2/-Si convolver structure. The annealing process uses a source of hydrogen created underneath the SiO/sub 2/-Si interface by implanting H/sub 3//sup +/ ion followed by rapid thermal anneal of 5s at 900/spl deg/C. The silicon nitride layer is inducted to protect ZnO films from hydrogen influx during low temperature oxygen anneal.