Abstract:
Efficient sputtering has been achieved in a cold-cathode discharge in a magnetron geometry under a strong magnetic field. The sputtering may be readily used for the produ...Show MoreMetadata
Abstract:
Efficient sputtering has been achieved in a cold-cathode discharge in a magnetron geometry under a strong magnetic field. The sputtering may be readily used for the production of thin-film microcircuits. The mechanism of the sputtering is discussed in connection with the mode of discharge.
Published in: Proceedings of the IEEE ( Volume: 55, Issue: 12, December 1967)
