A high sensitivity process variation sensor utilizing sub-threshold operation

In this paper, we propose a novel low-power, bias-free, high-sensitivity process variation sensor for monitoring random variations in the threshold voltage. The proposed sensor design utilizes the exponential current-voltage relationship of sub-threshold operation thereby improving the sensitivity by 2.3X compared to the above-threshold operation. A test-chip containing 128 PMOS and 128 NMOS devices has been fabricated in 65 nm bulk CMOS process technology. A total of 28 dies across the wafer have been fully characterized to determine the random threshold voltage variations.