I. Introduction
Wide band gap semiconductors like Silicon Carbide (SiC) and the III-IV nitrides are currently being developed for high power/temperature applications. Silicon carbide (SiC) is ideally suited for power conditioning applications due to its high saturated drift velocity, its mechanical strength, its excellent thermal conductivity, and its high critical field strength. For power devices, the tenfold increase in critical field strength of SiC relative to Si allows high voltage blocking layers to be fabricated significantly thinner than those of comparable Si devices. This reduces device on-state resistance and the associated conduction and switching losses, while maintaining the same high voltage blocking capability. Fig. 1 shows the theoretical specific on-resistance of blocking regions designed for certain breakdown voltages in Si and 4H-SiC, under optimum punch-through conditions [1]. The specific on-resistance of 4H-SiC is approximately 400 times lower than that of Si at a given breakdown voltage. This allows for high current operation at relatively low forward voltage drop. In addition, the wide band gap of SiC allows operation at high temperatures where conventional Si devices fail. Forward voltage drop vs. current density of Northrop Grumman's all-SiC Vertical Junction Field Effect Transistor (VJFET) based cascode switch, and those of commercial Si MOSFET, Si IGBT, and Si CoolMOS switches are shown in
Theoretical specific on-resistance of blocking regions designed for certain breakdown voltages in si and 4H-sic, under optimum punch-through conditions.