Preparation of SmCo amorphous magnetic film with perpendicular magnetization

Sm
x
Co
100-x
(
20 \leq x \leq 30
) films deposited on glass substrate and Sm
37.8
Co
62.2
films deposited on silicon substrate with perpendicular magnetization have been prepared by a magnetron rf sputtering. The influence of sputtering conditions, i.e. bias voltage; substrate temperature; composition and perpendicular magnetic field on perpendicular anisotropy are reported in detail.