Domain structure of TbFe magnetostrictive films by MFM

TbFe thin films with giant magnetostriction were deposited by DC magnetron sputtering onto Si(100) substrate at different sputtering parameters, including substrate temperatures (Ts, 20-420/spl deg/C), sputtering power (35-100 W) and sputtering time (5-30 min). The samples were amorphous as characterized by XRD. Effect of sputtering parameters on domain structure, as explored by magnetic force microscopy (MFM), was focused. The films prepared under different sputtering parameters showed different domain patterns, such as maze or/and spotty (bubble) ones. The easy axis either in-plane or out-of-plane is affected by film-deposition parameters, specifically the film thickness. The wall energy (L/spl gamma/) increases with him thickness, leading to looser bubble domains while the magnetic anisotropy constant (K/sub u/) decreases with increasing substrate temperature.