In-situ conductance measurement of surface specularity of NiFe, Co, Cu, Ag and Ta thin films

We have performed in-situ sheet conductance measurements of Co, Cu, Ni/sub 80/Fe/sub 20/, Ag, and Ta films during their growth on NiO or SiO/sub 2/ surfaces. The specularity and the roughness of the films are determined based on the Fuchs-Namba model. The roughness from the Fuchs-Namba model are compared with that measured by AFM. The material dependence of specularity is obtained. No appreciable difference in specularity has been found when the magnetic films are deposited on NiO or SiO/sub 2/ surfaces.