Micromechanical resonant magnetic sensor in standard CMOS

A novel magnetic field sensor has been fabricated using xenon difluoride etching of standard CMOS. The field is detected by measuring the vibration amplitude of a mechanical Lorentz force oscillator. The oscillator consists of a current loop on a silicon dioxide plate. Amplitude is detected with a polysilicon piezoresistor Wheatstone bridge. The devices were made in the Orbit 2 micron N-well process through MOSIS.