Influence of the thermal treatments and mechanical stress on the magnetic bistable behaviour in a Co-Si-B amorphous wire

The magnetic bistable behavior of Co/sub 72.5/Si/sub 12.5/B/sub 15/ amorphous wire has been investigated. The dependence of the switching field, H*, and reduced remanence, m/sub r/, on applied tensile stress ( sigma /sub a/) in wires subjected to single-current and stress-current annealing was observed. This dependence was obtained from the M/sub z/-H/sub z/ and M/sub z/-H/sub phi / hysteresis loops of the wire, and they suggest a different mechanism to that of the nucleation process for explaining the bistable magnetic behavior of the wire.<
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