Magneto-impedance in sputtered amorphous films for micro magnetic sensor

The magneto-impedance (MI) effect in RF sputtered (CoFe)/sub 80/B/sub 20/ zero-magnetostrictive amorphous films are presented. The relation between annealing conditions and MI characteristics was investigated. Impedance Z monotonously decreased with increasing applied field Hex when a high frequency sinusoidal current was applied to the sample annealed in a rotational field. In case of the samples having transverse anisotropy, Z sharply increases with Hex for the region Hex