Magnetic property variations of sputtered FeN films on substrate temperature and film thickness

FeN films were RF diode sputter deposited and magnetic property variations with substrate temperature and film thickness were investigated. Coercivity of the films with thickness of 6,000 /spl Aring/ did not increase substantially up to initial substrate temperature of 160/spl deg/C, which corresponded to the maximum substrate temperature of 240/spl deg/C during deposition. Easy axis coercivity of single layer films peaked at the film thickness of 580 /spl Aring/ and hard axis coercivity did not vary noticeably down to 300 /spl Aring/ of film thickness. Multilayer films of total thickness of 6,000 /spl Aring/ showed minimum easy axis coercivity of 0.65 Oe at the layer thickness of 950 /spl Aring/ and hard axis coercivity variation with respect to the layer thickness, similar to that of single layer films.